Ende verpflichten Gesetz selective laser etching tatsächlich Moos Tiger
Selective laser etching of sapphire glasses | Industrial Laser Solutions
PDF) Optimization of selective laser-induced etching (SLE) for fabrication of 3D glass microfluidic device with multi-layer micro channels
From Microsaws to Nanodrills: Laser Pulses Act As Industrial-Grade Machining Tools
OSA | Polarization-selective etching in femtosecond laser-assisted microfluidic channel fabrication in fused silica
OSA | Optimisation of ultrafast laser assisted etching in fused silica
Polarization-insensitive space-selective etching in fused silica induced by picosecond laser irradiation
Selective laser-induced etching enables 3D machining of transparent materials | Industrial Laser Solutions
Optimization of selective laser-induced etching (SLE) for fabrication of 3D glass microfluidic device with multi-layer micro channels | Micro and Nano Systems Letters | Full Text
Development of Micro Selective Laser Melting: The State of the Art and Future Perspectives - ScienceDirect
Three-dimensional femtosecond laser processing for lab-on-a-chip applications
PDF] 3D-Microstructuring of Sapphire using fs-Laser Irradiation and Selective Etching | Semantic Scholar
SELECTIVE LASER ETCHING - Femtika
Optimisation of ultrafast laser assisted etching in fused silica
Optimization of selective laser-induced etching (SLE) for fabrication of 3D glass microfluidic device with multi-layer micro channels | Micro and Nano Systems Letters | Full Text
Selective laser-induced etching enables 3D machining of transparent materials | Industrial Laser Solutions
Selective Laser-induced Etching - RWTH AACHEN UNIVERSITY Chair for Laser Technology LLT - English
Selective laSer etching of glaSS and Sapphire - laSer etching of glaSS and Sapphire FRAUNHOFER INSTITUTE FOR LASER TEcHNOLOgy ILT DQS certified by DIN EN ISO 9001 Reg.-No.: DE-69572-01 - [PDF Document]
Selective Laser-induced Etching - RWTH AACHEN UNIVERSITY Chair for Laser Technology LLT - English
OSA | Femtosecond laser induced selective etching in fused silica: optimization of the inscription conditions with a high-repetition-rate laser source